SLA (Stereolithography) se yon pwosesis fabrikasyon aditif ki travay lè li konsantre yon lazè UV sou yon kuv nan résine fotopolymère. Avèk èd nan manifakti ki ede òdinatè oswa lojisyèl òdinatè ede konsepsyon (CAM / CAD), yo itilize lazè UV pou trase yon konsepsyon oswa fòm pre-pwograme sou sifas la nan vat fotopolymère. Photopolymers yo sansib a limyè iltravyolèt, kidonk résine a solidifye fotochimik epi fòme yon sèl kouch objè 3D vle a. Pwosesis sa a repete pou chak kouch konsepsyon an jiskaske objè 3D a fini.
CARMANHAAS ta ka ofri kliyan sistèm optik la sitou gen ladan eskanè galvanomèt vit ak lantiy eskanè F-THETA, ekspansyon gwo bout bwa, glas, elatriye.
Tèt eskanè Galvo 355nm
| Modèl | PSH14-H | PSH20-H | PSH30-H |
| Dlo fre/sele tèt eskanè | wi | wi | wi |
| Ouvèti (mm) | 14 | 20 | 30 |
| Efektif Scan Angle | ± 10° | ± 10° | ± 10° |
| Erè Tracking | 0.19 ms | 0.28ms | 0.45ms |
| Tan Repons Etap (1% nan echèl konplè) | ≤ 0.4 ms | ≤ 0.6 ms | ≤ 0.9 ms |
| Vitès tipik | |||
| Pozisyon / so | < 15 m/s | < 12 m/s | < 9 m/s |
| Liy optik/mastrik optik | < 10 m/s | < 7 m/s | <4 m/s |
| Eskanè vektè tipik | <4 m/s | < 3 m/s | <2 m/s |
| Bon kalite ekriti | 700 cps | 450 cps | 260 cps |
| Segondè kalite ekriti | 550 cps | 320 cps | 180 cps |
| Presizyon | |||
| Linearite | 99.9% | 99.9% | 99.9% |
| Rezolisyon | ≤ 1 urad | ≤ 1 urad | ≤ 1 urad |
| Repetebilite | ≤ 2 urad | ≤ 2 urad | ≤ 2 urad |
| Tanperati Drift | |||
| Konsantre drift | ≤ 3 urad/℃ | ≤ 3 urad/℃ | ≤ 3 urad/℃ |
| Qver 8 èdtan alontèm Offset Drift （Apre 15min avètisman） | ≤ 30 urad | ≤ 30 urad | ≤ 30 urad |
| Fonksyone Tanperati Range | 25℃±10℃ | 25℃±10℃ | 25℃±10℃ |
| Entèfas siyal | Analòg: ± 10V Digital: XY2-100 pwotokòl | Analòg: ± 10V Digital: XY2-100 pwotokòl | Analòg: ± 10V Digital: XY2-100 pwotokòl |
| Kondisyon pouvwa Antre (DC) | ± 15V @ 4A Max RMS | ± 15V @ 4A Max RMS | ± 15V @ 4A Max RMS |
Lantiy 355nm F-Theta
| Deskripsyon Pati | Longè Fokal (mm) | Scan Field (mm) | Max Antre Elèv (mm) | Distans travay (mm) | Montaj Fil |
| SL-355-360-580 | 580 | 360x360 | 16 | 660 | M85x1 |
| SL-355-520-750 | 750 | 520x520 | 10 | 824.4 | M85x1 |
| SL-355-610-840-(15CA) | 840 | 610x610 | 15 | 910 | M85x1 |
| SL-355-800-1090-(18CA) | 1090 | 800x800 | 18 | 1193 | M85x1 |
355nm gwo bout bwa ekspansyon
| Deskripsyon Pati | Ekspansyon Rapò | Antre CA (mm) | Sòti CA (mm) | Lojman Dyamèt (mm) | Lojman Longè (mm) | Montaj Fil |
| BE3-355-D30:84.5-3x-A(M30*1-M43*0.5) | 3X | 10 | 33 | 46 | 84.5 | M30 * 1-M43 * 0.5 |
| BE3-355-D33:84.5-5x-A(M30*1-M43*0.5) | 5X | 10 | 33 | 46 | 84.5 | M30 * 1-M43 * 0.5 |
| BE3-355-D33:80.3-7x-A(M30*1-M43*0.5) | 7X | 10 | 33 | 46 | 80.3 | M30 * 1-M43 * 0.5 |
| BE3-355-D30:90-8x-A(M30*1-M43*0.5) | 8X | 10 | 33 | 46 | 90.0 | M30 * 1-M43 * 0.5 |
| BE3-355-D30:72-10x-A(M30*1-M43*0.5) | 10X | 10 | 33 | 46 | 72.0 | M30 * 1-M43 * 0.5 |
355nm glas
| Deskripsyon Pati | Dyamèt (mm) | Epesè (mm) | Kouch |
| 355 Iwa | 30 | 3 | HR @ 355nm, 45 ° AOI |
| 355 Iwa | 20 | 5 | HR @ 355nm, 45 ° AOI |
| 355 Iwa | 30 | 5 | HR @ 355nm, 45 ° AOI |
